by DUO, L, FINAZZI, M, CICCACCI, F and BRAICOVICH, L
Abstract:
We report a room-temperature UV inverse-photoemission study of the early oxidation stages of polycrystalline cobalt within the photon energy range 12-25 eV for exposures between 1 and 10(4) Langmuir (L) (1 L= 10(-6) Torr s). The decomposition of each spectrum related to intermediate exposures in terms of bulk Co and oxidized Co, together with the analysis of the relative intensities for the different contributions, shows the stable formation of CoO at the interface for exposures greater-than-or-equal-to 30 L, whereas for lower exposures the oxide stoichiometry depends on the amount of oxygen atoms. In the 5-7-L range, possible Co3O4 formation takes place consistently with a decreased interdiffusion in this regime as compared to the higher exposures regime. An estimation of the oxide film thickness at the maximum exposure is performed giving a surface oxide thickness of about 20 angstrom.
Reference:
INTERACTION OF OXYGEN WITH POLYCRYSTALLINE COBALT STUDIED BY INVERSE-PHOTOEMISSION SPECTROSCOPY (DUO, L, FINAZZI, M, CICCACCI, F and BRAICOVICH, L), In PHYSICAL REVIEW B, AMERICAN PHYSICAL SOC, volume 47, 1993.
Bibtex Entry:
@article{ ISI:A1993LJ15400057, Author = {DUO, L and FINAZZI, M and CICCACCI, F and BRAICOVICH, L}, Title = {{INTERACTION OF OXYGEN WITH POLYCRYSTALLINE COBALT STUDIED BY INVERSE-PHOTOEMISSION SPECTROSCOPY}}, Journal = {{PHYSICAL REVIEW B}}, Year = {{1993}}, Volume = {{47}}, Number = {{23}}, Pages = {{15848-15851}}, Month = {{JUN 15}}, Abstract = {{We report a room-temperature UV inverse-photoemission study of the early oxidation stages of polycrystalline cobalt within the photon energy range 12-25 eV for exposures between 1 and 10(4) Langmuir (L) (1 L= 10(-6) Torr s). The decomposition of each spectrum related to intermediate exposures in terms of bulk Co and oxidized Co, together with the analysis of the relative intensities for the different contributions, shows the stable formation of CoO at the interface for exposures greater-than-or-equal-to 30 L, whereas for lower exposures the oxide stoichiometry depends on the amount of oxygen atoms. In the 5-7-L range, possible Co3O4 formation takes place consistently with a decreased interdiffusion in this regime as compared to the higher exposures regime. An estimation of the oxide film thickness at the maximum exposure is performed giving a surface oxide thickness of about 20 angstrom.}}, Publisher = {{AMERICAN PHYSICAL SOC}}, Address = {{ONE PHYSICS ELLIPSE, COLLEGE PK, MD 20740-3844 USA}}, Type = {{Article}}, Language = {{English}}, Affiliation = {{DUO, L (Corresponding Author), POLITECN MILAN,DIPARTIMENTO FIS,PIAZZA LEONARDO DA VINCI 32,I-20133 MILAN,ITALY.}}, DOI = {{10.1103/PhysRevB.47.15848}}, ISSN = {{0163-1829}}, Keywords-Plus = {{ELECTRONIC-STRUCTURE; OVERLAYER; OXIDATION; SURFACES; NI(100); NI(111); STATES; METALS}}, Research-Areas = {{Materials Science; Physics}}, Web-of-Science-Categories = {{Materials Science, Multidisciplinary; Physics, Applied; Physics, Condensed Matter}}, ResearcherID-Numbers = {{Duo, Lamberto/N-9311-2014 Finazzi, Marco/M-7401-2015 ciccacci, franco/N-9392-2013 }}, ORCID-Numbers = {{Finazzi, Marco/0000-0002-9197-3654 ciccacci, franco/0000-0002-1131-4748 Braicovich, Lucio/0000-0001-6548-9140}}, Number-of-Cited-References = {{18}}, Times-Cited = {{11}}, Usage-Count-Last-180-days = {{0}}, Usage-Count-Since-2013 = {{3}}, Journal-ISO = {{Phys. Rev. B}}, Doc-Delivery-Number = {{LJ154}}, Unique-ID = {{ISI:A1993LJ15400057}}, DA = {{2020-12-22}}, }
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